Current Headlines
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                    Rigaku Introduces Two Innovations In Semiconductor Metrology At ICSCRM 2025
                        9/12/2025
                    Rigaku Corporation, a global leader in X-ray analytical instrumentation, will present two breakthrough platforms at the International Conference on Silicon Carbide and Related Materials (ICSCRM) in Busan, Korea. 
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                    Aeva Unveils Eve 1V High-Precision, Non-Contact Motion Sensor For Next-Generation Manufacturing Automation
                        9/10/2025
                    Aeva, a leader in next-generation sensing and perception systems, today announced the introduction of Aeva Eve 1V, a high-precision, non-contact motion sensor with the potential to redefine industrial speed, length, and position measurement wherever traditional encoders and tactile sensors are used in manufacturing today. 
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                    Medical Manufacturing Technologies (MMT) Unveils The Glebar P5K Gauging System: Revolutionizing Guidewire Measurement And Metrology Processes With Unmatched Speed And Accuracy
                        9/9/2025
                    Medical Manufacturing Technologies (MMT), a leading global provider of medical device manufacturing services and solutions, proudly announces the launch of the ground-breaking, patented Glebar P5K Gauging System. 
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                    Onto Innovation Launches Next Generation OCD Metrology Platform To Enable Process Control For Advanced AI Devices
                        9/9/2025
                    Onto Innovation Inc. today introduced the Atlas G6 optical critical dimension (OCD) metrology system, designed to address the growing complexity of process control in advanced semiconductor nodes. 
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                    Advantest Introduces Advanced Mask CD-SEM 'E3660'
                        9/9/2025
                    Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today announced the release of its next-generation CD-SEM* E3660, engineered for the dimensional metrology of photomasks and EUV masks used in cutting-edge semiconductor manufacturing. 
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                    EV Group Achieves Breakthrough In Hybrid Bonding Overlay Control For Chiplet Integration
                        9/8/2025
                    EV Group (EVG), a leading provider of innovative process solutions and expertise serving leading-edge and future semiconductor designs and chip integration schemes, today unveiled the EVG®40 D2W—the first dedicated die-to-wafer overlay metrology platform to deliver 100 percent die overlay measurement on 300-mm wafers at high precision and speeds needed for production environments. 
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                    ReLogic Research Launches ReLogic3D, Bringing Metrology-Grade 3D Scanning Solutions To U.S. Industries
                        9/5/2025
                    ReLogic Research today announced the launch of ReLogic3D, a new distribution and solutions company making high-precision 3D scanning technology more accessible to U.S. industries. 
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                    Mitutoyo Introduces Sensible Measurement For Everyone With The New Bold Compact QM-Fit Measurement System
                        9/4/2025
                    Mitutoyo America Corporation, the world leader in metrology instruments, introduces the QM-Fit Smart Vision System. The QM-Fit represents a BOLD step forward in optical metrology. 
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                    Koh Young Showcases Advanced Dimensional Metrology And Inspection Solutions For Semiconductor And Wafer-Level Packaging At SEMICON West
                        9/3/2025
                    Koh Young Technology, the industry leader in True 3D measurement-based dimensional metrology and inspection solutions, will present its latest advancements for semiconductor and advanced packaging applications at SEMICON West 2025 in Booth 5949. 
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                    GaN-Based e-Beam Inspection And Metrology Co-Developed By Startup Photo Electron Soul Inc. And Nagoya University Will Be Evaluated By Kioxia, A Leading Flash Memory Producer
                        9/1/2025
                    It was announced today that GaN (Gallium Nitride)-based e-Beam inspection and metrology for advanced semiconductor manufacturing, jointly developed by Nagoya University startup Photo electron Soul Inc. (PeS; CEO: Takayuki Suzuki) and the Nagoya University Amano-Honda Laboratory, will be evaluated by Kioxia Iwate Corporation (President and CEO: Koichiro Shibayama) in late September. 
