Release Of The VG-500S Capacitance Manometer

Enables response times approximately four times faster^*1 than conventional models, supporting to the stable operation of semiconductor manufacturing processes

HORIBA STEC Co., Ltd. (hereafter “HORIBA STEC”) has released the VG-500S Capacitance Manometer for measuring pressure inside vacuum chambers. The VG-500S enables highly accurate and stable pressure measurements, even in high-temperature semiconductor manufacturing processes in the range of 100 to 200^°C.

As semiconductor devices continue to be miniaturized and adopt three-dimensional structures, manufacturing processes are becoming increasingly complex, incorporating an ever-expanding variety of process gases. In film deposition, etching, and similar processes, it is essential to precisely control reactions of these gases and prevent contamination by maintaining a vacuum within the reaction chamber (where the various silicon wafer processing steps are carried out). In particular, when using materials with low vapor pressure^*2, it is necessary to heat the entire gas delivery line to maintain a constant temperature and thereby prevent the vaporized gas from cooling and condensing back into a liquid. Accordingly, vacuum gauges used in such environments need to be able to maintain the sensor section at an appropriate temperature when measuring pressure in order to prevent the vaporized material from condensing or undergoing thermal decomposition.

With the VG-500S, customers can select the temperature of the sensor section within a range from 100 to 200°C according to their specific process requirements and the gases used. (The desired temperature must be specified at the time of order.) This flexibility helps reduce the risk of condensation or thermal decomposition occurring within the sensor section, enabling stable pressure measurements. The pressure sensor section also employs a proprietary algorithm designed to reduce response times^*3 to approximately one-quarter^*1 of conventional models and, with the incorporation of a stainless-steel diaphragm^*4, enables both fast response and high-precision measurement. These features help stabilize the operation and improve the controllability of semiconductor manufacturing processes.

Koji Imamura, head of the Development Division, commented, “Since releasing the VG-200 Capacitance Manometer in 2015, HORIBA STEC has continued to roll out the VG Series both in Japan and overseas, where it has earned high praise for its precision and stability. With the addition of the VG-500S, which meets the demand for pressure measurements in high-temperature processes while offering the same features as the VG-200S—highly acclaimed in overseas markets—we are further expanding our lineup and bolstering our global sales structure.”

Going forward, HORIBA STEC will continue to respond to the stringent requirements of semiconductor manufacturing sites, providing optimal process management solutions through its broad product portfolio and proven technological expertise.

^*1 Based on a comparison with HORIBA STEC’s VG-500 and research conducted by HORIBA STEC. Effectiveness may vary depending on usage methods and conditions.
^*2 The pressure at which a substance transitions from liquid to gas. The lower a substance’s vapor pressure, the less likely it is to vaporize.
^*3 The time required to detect a change in pressure and reflect it in the measured value. The shorter the response time, the more control users have in semiconductor manufacturing processes.
^*4 A thin membrane used to sense pressure. The diaphragm flexes slightly when external pressure is applied, and the pressure is measured by detecting the extent of this displacement.