KLA-Tencor's SpectraCD-XT Significantly Reduces Cost-of-Ownership Of CD Metrology
San Jose, CA - KLA-Tencor introduced its latest-generation optical CD metrology system, the SpectraCD-XT, which provides cost-effective inline CD and profile measurements of critical device structures that help enable early prediction of IC performance and yield at the 90-nm and 65-nm nodes. The only high-performance spectroscopic ellipsometry (SE)-based CD metrology tool with sub-two-second move-acquire-measure (MAM) time, SpectraCD-XT provides a two-fold increase in throughput (to more than 100 wph) compared to KLA-Tencor's previous-generation platform at comparable performance. This enables chipmakers to meet their increased sampling requirements at the lowest cost-per-yield-relevant measurement. SpectraCD-XT is built on a production-proven platform used by 9 out of the top 10 chipmakers. The tool is an ideal CD control solution for high-volume IC manufacturers, where high productivity and low cost-of-ownership (CoO) are essential.
Chipmakers face shrinking process windows and tighter process tolerances as they scale to smaller design rules. As a result, minute lithography process variations can significantly impact device performance and functional yields. This drives the need for increased measurement sampling early in the manufacturing cycle with minimal impact to fab productivity. In addition to requiring standard CD linewidth information, increasing hidden systematic errors in lithography today mandate the need for 3D profile information on device structures, including sidewall angle, and top and bottom CD, to obtain yield-relevant data that provides better correlation to back-end-of-line (BEOL) device performance tests.
"In wafer patterning, the quality of gate and STI structures is a key contributor to the maximum performance potential of semiconductor devices," stated Avi Cohen, group vice president of the Parametric Solutions Group at KLA-Tencor. "Our customers want careful monitoring and control over these structures to ensure that products at end-of-line test meet required performance specifications. In a high-volume manufacturing environment, however, the last thing you need is for metrology to be a bottleneck on fab productivity. We are pleased that multiple customers have selected KLA-Tencor's SpectraCD-XT optical CD metrology system due to its ability to cost-effectively provide CD and critical profile information at high throughputs, allowing them to meet their high-volume production requirements."
SOURCE: KLA-Tencor