Newsletter | December 12, 2008

12.12.08 -- Major Breakthrough In Standardizing Quality Measurement Data
Top News Stories
Rudolph NSX Selected For Inspection And Metrology Of New Through-Silicon Via Process
Rudolph Technologies, Inc., a worldwide leader in process characterization solutions for the semiconductor manufacturing industry, announced recently the successful installation of an NSX 115 Macro Inspection System at a major European fab.

Metris To Incorporate New SpecMetrix Coating Measurement Technology Into Innovative iGPS Metrology System
Global metrology leader Metris and Sensory Analytics, an emerging U.S. leader in non-contact coating measurement solutions, today announced that Metris will incorporate award-winning SpecMetrix coating measurement technologies from Sensory into its highly successful iGPS tracking and positioning system.

JET Performance Products Releases New Air/Fuel Monitor To Improve Gas Mileage
JET Performance Products has announced the release of an Air/Fuel Monitor for any vehicle with an Oxygen Sensor.

QMD Certification -- A Major Breakthrough In Standardizing Quality Measurement Data For All Industries Worldwide
For the first time ever, companies in hundreds of business sectors globally will have the ability to share electronic measurement data utilizing one simple, seamless and generic format.

daratechPLANT 2009 Conference Launches Plant Asset Scanning Summit
daratechPLANT, announced today that it will be expanding its content in 3D imaging and laser scanning for the power/energy, petrochemicals/chemicals, oil & gas and shipbuilding industries with its new Plant Asset Scanning Summit.

Nanometrics Announces Caliper InSight Overlay Metrology System
Nanometrics Incorporated, today announced the launch of its Caliper InSight, a turnkey, image-based overlay metrology solution for advanced high-volume IC manufacturing.

NuFlare Orders Next Generation Photomask Registration And Overlay Metrology System From Carl Zeiss
NuFlare Technology, has ordered one of the first PROVE™ systems for Photomask Registration and Overlay Metrology from Carl Zeiss SMT.

EV Group Introduces New Suite Of Aligners And Measurement Systems For 3D IC And Other Advanced Semiconductor, MEMS And Nanotechnology Device Manufacturing
EV Group (EVG), reecntly introduced the NT series — a new, yet already field-proven suite of mask aligners, wafer-to-wafer (W2W) bond aligners and measurement systems — to address increased demand for higher precision alignment accuracy.

IAB Launches Audience Reach Measurement Guidelines
The Interactive Advertising Bureau (IAB) today announced the release for public comment of Audience Reach Measurement Guidelines, a major industry-wide initiative that provides clear, consistent definitions of metrics and sets standards for how to measure unique audience across different methodologies.

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