Business Wire

  1. Spatial Releases ACIS And 3D InterOp R21
    5/18/2010
    Spatial Corp., a leading provider of 3D development components for design, manufacturing and engineering applications, today announces 3D ACIS Modeler and 3D InterOp Suite Release 21 (R21)
  2. Veeco Introduces ContourGT Surface Metrology Product Family
    4/6/2010
    Veeco Instruments Inc., a leading global provider of precision metrology solutions for scientific and industrial markets, today announced the ContourGT Surface Metrology Product Family, Veeco's 10th generation of precision, non-contact, 3D optical surface profilers that delivers up to 10x capacity and throughput improvements over other systems on demanding surface measurements and analyses, enabling new levels of efficiency and capability
  3. CEA-Leti's Hybrid Metrology Project Targets Better R&D Cycle Times And Yields At Sub-28nm Nodes
    3/31/2010
    CEA-Leti, a leading global research center committed to creating and commercializing innovation in micro- and nanotechnologies, said today that its Hybrid Metrology Project has developed a way to reduce measurement uncertainty in the sub-28nm nodes
  4. QED Technologies Announces Implementation Of Its ASI® Metrology System For Aspheres By Leibniz Institute For Surface Modification
    3/4/2010
    QED Technologies, the pioneer and exclusive provider of Magnetorheological Finishing (MRF) and Subaperture Stitching Interferometry (SSI), announces implementation of one of its new Aspheric Stitching Interferometers (ASI) at the Leibniz Institute for Surface Modification (IOM) in Leipzig, Germany
  5. Veeco Introduces The NT9080 Surface Metrology System
    1/26/2010
    Veeco Instruments Inc., a leader in scientific and industrial metrology, today introduced the NT9080 Surface Metrology System, which combines non-contact white light interferometry, operator ease of use, and affordability for both expert- and entry-level precision surface measurements
  6. Advantest Announces Availability Of Its CD-SEM Metrology Tool For Photomask Applications
    1/5/2010
    Advantest Corporation (TSE: 6857, NYSE: ATE) today announced availability of its new SEM-based Critical Dimension (CD) measurement system for photomasks. The E3610 and E3620 advanced mask metrology tools, developed and manufactured by Advantest since 2004 on an OEM basis for a leading supplier of metrology systems, are now available directly from Advantest as part of its advanced technology product lineup
  7. Revware Systems Announces MobiGage, A Hand-Held, Wireless 3D Metrology System For MicroScribe Portable Digitizers
    1/5/2010
    Revware Systems, Inc., the leading developer of CAD-Driven Reverse Engineering software and manufacturer of the MicroScribe digitizer for touch and laser digitizing solutions, announces worldwide release of MobiGage, a uniquely integrated metrology system for MicroScribe digitizers
  8. Agilent Technologies’ Infiniium 9000 Series Oscilloscope Wins EDN China Innovation Award For Best Test And Measurement Product
    12/7/2009
    Agilent Technologies Inc. recently announced its Infiniium 9000 Series Oscilloscopes family has won the 2009 EDN China Innovation Award for the Best Test and Measurement Product
  9. Nanometrics Announces Follow-On Order For Atlas XP Metrology Systems From Leading Memory Customer
    12/2/2009
    Nanometrics Incorporated, a leading supplier of advanced process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, today announced a follow-on order for ten of its Atlas XP metrology systems, as well as industry-leading NanoDiffract software, from a leading memory customer
  10. Nanometrics Announces Multi-System Integrated Metrology Order From Leading Foundry
    11/2/2009
    Nanometrics Incorporated today announced a multi-system order from a leading semiconductor foundry for its Integrated Metrology (IM) and NanoCD™ suite solutions. The systems will be delivered in the fourth quarter of this year for optical critical dimension (OCD) metrology on 22nm gate etch applications

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